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• W1964421928 abstract "Theoretical and experimental studies on MOS capacitors built on p-type Si substrates with different Al2O3 thickness (100–600 Å), have been carried out. The oxide capacitance, (CminCmax) ratio and conductance are shown to be a function of both the oxide thickness and area. The study also includes the γ-radiation effects with doses up to 1.0 Mrad. Low γ-doses up to 350 krad are shown to improve the (CminCmax) ratio, for samples with an oxide layer of 600 Å, from their initial value of 0.904 to 0.346. For higher γ-doses, up to 750 krad, the devices lose their main feature as capacitors, where the CminCmax ratio value of unity is reached. Samples with oxide layers less than 600 Å are shown to lose their characteristics gradually; due to dose increase. The surface depletion region width, at the strong inversion, semicondictor resistance and oxide charge are shown to increase from 22.0 Å, 100 ω and 6.50 × 1012 C/cm2, to 400 Å, 95.0 kω and 10.85 × 1012 C/cm2, respectively, due to γ-doses up to 1.0 Mrad. Finally, oven annealing of the irradiated samples, at 350°C for 30.0 min, recovers most of the initial characteristics." @default.
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• W1964421928 date "1995-05-01" @default.
• W1964421928 modified "2023-10-16" @default.
• W1964421928 title "Characteristics and radiation effects of MOS capacitors with Al2O3 layers in p-type silicon" @default.
• W1964421928 cites W2033971604 @default.
• W1964421928 cites W2039996722 @default.
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• W1964421928 doi "https://doi.org/10.1016/0969-8043(94)00141-l" @default.
• W1964421928 hasPublicationYear "1995" @default.
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