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- W1964574938 endingPage "1971" @default.
- W1964574938 startingPage "1969" @default.
- W1964574938 abstract "Hole concentrations up to 1017 cm−3 are achieved in GaN doped with C from a CCl4 source during metalorganic molecular beam epitaxy at 700 °C. The hole mobility under these conditions is 103 cm2 V−1 s−1 at 300 K. The deposition rate of the GaN is reduced by addition of CCl4 to the growth chemistry even at low flow rates and net etching is observed for a halocarbon flow above 1.1 sccm under our conditions. Annealing up to 800 °C did not increase the hole concentration indicating that residual hydrogen passivation of the acceptors is not significant when employing a He carrier gas for transporting the group III metalorganic precursor (triethylgallium)." @default.
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- W1964574938 date "1995-04-10" @default.
- W1964574938 modified "2023-10-18" @default.
- W1964574938 title "<i>CCl</i><sub>4</sub> doping of GaN grown by metalorganic molecular beam epitaxy" @default.
- W1964574938 doi "https://doi.org/10.1063/1.113293" @default.
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