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• W1964702145 abstract "Abstract The motion of 200 keV B ions in the [111] direction in a silicon single crystal has been investigated using a computer simulation method. Profiles of the depth distribution of implanted ions for both an ideal crystal and a crystal with thermal vibrations have been obtained. A study of the defect distribution has been carried out." @default.
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• W1964702145 date "1972-04-01" @default.
• W1964702145 modified "2023-09-24" @default.
• W1964702145 title "Computer studies of boron ion channeling in silicon single crystals" @default.
• W1964702145 cites W1977317172 @default.
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• W1964702145 doi "https://doi.org/10.1080/00337577208231185" @default.
• W1964702145 hasPublicationYear "1972" @default.
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