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- W1964925255 abstract "Observations are described of a diffusion-induced change in the spacing of moiré fringes from thin bimetallic films at low temperatures where the diffusion coefficients are small (<10-15 cm2 s-1). Experiments were carried out with specimens consisting of a layer of approximately 400 Å Cu vapour deposited onto an electropolished Ni substrate approximately 1000 Å thick. After annealing in the electron microscope at different temperatures an increase in the average spacing M of the moiré fringes was observed. It was found that 1−M0M varies linearly with t12, where M0 is the original moiré spacing and t is the annealing time at a given temperature. According to a highly simplified model of electron diffraction the diffusion coefficient can be obtained from the slope of the 1−M0Mversus t12 plot. From experiments at 450°C, 500°C and 550°C the frequency factor D0 and the activation energy Q for diffusion were established: D0 = 0.2 cm2 s-1, Q = 54.6 kcal mol-1. These values are in good agreement with published data for volume diffusion in the Cu-Ni system at higher temperatures." @default.
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- W1964925255 date "1977-03-01" @default.
- W1964925255 modified "2023-09-24" @default.
- W1964925255 title "The effect of interdiffusion on moiré patterns of thin bimetallic films" @default.
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- W1964925255 doi "https://doi.org/10.1016/0040-6090(77)90401-1" @default.
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