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• W1965012004 abstract "Transparent Si-doped TiO2 thin films (Si-TiO2) were deposited on quartz glasses using electron beam evaporation (EBE) and annealed at different temperature in an air atmosphere. The structure and morphology of these films were analyzed by X-ray diffraction (XRD), Raman microscopy (Raman), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Meanwhile the photocatalytic activity of the films has also been evaluated on the basis of the degradation degree of rhodamine B in aqueous solution. Our experimental results suggest that the annealing temperature impact a strong effect on the structure, morphology and photocatalytic activity of Si-TiO2 thin films. Furthermore the enhanced thermal stability of Si-TiO2 films enabled them to elevate the phase transformation temperature of TiO2 from anatase to rutile and enhanced the photocatalytic efficiency." @default.
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• W1965012004 date "2011-10-01" @default.
• W1965012004 modified "2023-10-16" @default.
• W1965012004 title "Study of effect annealing temperature on the structure, morphology and photocatalytic activity of Si doped TiO2 thin films deposited by electron beam evaporation" @default.
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• W1965012004 doi "https://doi.org/10.1016/j.apsusc.2011.07.085" @default.
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