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- W1965061760 abstract "With tighter CD uniformity requirements, a tighter temperature control during a Post Exposure Bake (PEB) process for photomask production becomes more and more important. CD non uniformities can be partially ascribed to deficiencies of the measurement devices used for the process qualification of a PEB hotplate system. In this paper, a new routine is proposed to overcome the deficiencies of the measurement devices used, so that further improvement of the hotplate performance becomes possible. Using a 25 point sensor array, we finally achieved a bake performance of the hotplate system described in terms of real total temperature range on the mask surface, of 0.4°C during temperature ramp-up and below 0.1°C at steady state for a final mean temperature of 100°C. This is a first step in the right direction towards a temperature range of zero for the bake process." @default.
- W1965061760 created "2016-06-24" @default.
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- W1965061760 date "2008-10-24" @default.
- W1965061760 modified "2023-09-23" @default.
- W1965061760 title "Road to a zero degree total temperature range post exposure bake process" @default.
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- W1965061760 doi "https://doi.org/10.1117/12.801369" @default.
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