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• W1965430905 abstract "Graphene oxide (GO), one of the best transparent substrates for electron microscopy of biological substances, is known to be not very stable to exposure to electron beams (e-beams). We present a method of the preparation of GO film highly resistive to e-beams by controlling layer-by-layer thickness and quantitatively examined the stability of GO film thus prepared. Scanning transmission electron microscopic measurements were engaged in these films with 10-kV acceleration-voltage. A simple method is proposed to classify the layer structure of GO. As an application of the method, we determined the electron attenuation length through GO film in nm scale." @default.
• W1965430905 created "2016-06-24" @default.
• W1965430905 creator A5019443148 @default.
• W1965430905 creator A5022170872 @default.
• W1965430905 date "2013-03-15" @default.
• W1965430905 modified "2023-09-26" @default.
• W1965430905 title "Stability of Graphene Oxide Film to Electron Beam Irradiation and Possible Thickness Dependence of Electron Attenuation" @default.
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• W1965430905 doi "https://doi.org/10.1246/bcsj.20120267" @default.
• W1965430905 hasPublicationYear "2013" @default.
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