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- W1965451005 abstract "The contributions of various adsorbed processes to electrochemical impedance Z and dissolution efficiency Φ diss in metal dissolution have been discussed on the basis of numerical analyses. The Φ diss is the ratio of the current consumed by metal dissolution to the total current in the frequency domain, and can be obtained by a channel flow double electrode (CFDE) with an electrochemical impedance spectroscopy (EIS). The modulation of adsorption coverage A θ/ΔE is represented as the function of angular frequency ω in the frequency domain: Δ θ/ΔE=a θ1 /(j ω a θ2 +1), where a i is a constant. Moreover, the admittance A F and impedance Z are related to the A θ/Δ E: A F =a A1 +a A2 Δ θ/ΔE, 1/Z=A F +j ω C dl , where C dl is a capacitance of electric double layer. The presences of adsorbed species yield the unique loci of Z on the complex plane, i.e., inductive loop and negative resistance. The inductive loop appears in the three kinds of adsorption in the metal dissolution, i.e., (i) adsorbed intermediate, (ii) catalytic adsorbed species, and (iii) cathodic adsorbed species. The Φ diss is represented as: Φ diss = a Φ1 + a Φ2 Z F , where Z F is the Faradaic impedance. The relations between Φ diss and Z have been discussed." @default.
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- W1965451005 date "1998-08-01" @default.
- W1965451005 modified "2023-09-25" @default.
- W1965451005 title "Frequency Domain Analysis of Metal Dissolution by Channel Flow Double Electrode" @default.
- W1965451005 doi "https://doi.org/10.4028/www.scientific.net/msf.289-292.789" @default.
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