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- W1965864232 abstract "This paper reports on the development of advanced bilayer resists for ArF and F<sub>2</sub> lithography. Contamination of the optics with silicon has been identified as a major issue for the adoption of bilayer technology across all wavelengths. An investigation was carried out to fundamentally understand the effect of the polymer architecture on silicon outgassing. A laser outgassing system was developed and calibrated using model silicon compounds. Model polymers where prepared in which the silicon was incorporated in a number of different ways pendant to the polymer backbone and in the polymer backbone. It was observed that the placement of silicon into the polymer backbone as a poly(silsesquioxane), allows the incorporation of high silicon content for superior etch resistance, with no detectable outgassing of silicon during the exposure step. The design concepts used for these ultra thin silicon imaging systems has resulted in superior imaging capability, resolving sub 100nm dense patterns." @default.
- W1965864232 created "2016-06-24" @default.
- W1965864232 creator A5000310251 @default.
- W1965864232 creator A5013972963 @default.
- W1965864232 creator A5021952005 @default.
- W1965864232 creator A5028615222 @default.
- W1965864232 creator A5029364145 @default.
- W1965864232 creator A5035701638 @default.
- W1965864232 creator A5038811541 @default.
- W1965864232 creator A5044098423 @default.
- W1965864232 creator A5046173944 @default.
- W1965864232 creator A5061433318 @default.
- W1965864232 creator A5063428418 @default.
- W1965864232 creator A5070535511 @default.
- W1965864232 date "2003-06-11" @default.
- W1965864232 modified "2023-10-17" @default.
- W1965864232 title "Bilayer technology for ArF and F 2 lithography: the development of resists to minimize silicon outgassing" @default.
- W1965864232 doi "https://doi.org/10.1117/12.485141" @default.
- W1965864232 hasPublicationYear "2003" @default.
- W1965864232 type Work @default.
- W1965864232 sameAs 1965864232 @default.
- W1965864232 citedByCount "5" @default.
- W1965864232 crossrefType "proceedings-article" @default.
- W1965864232 hasAuthorship W1965864232A5000310251 @default.
- W1965864232 hasAuthorship W1965864232A5013972963 @default.
- W1965864232 hasAuthorship W1965864232A5021952005 @default.
- W1965864232 hasAuthorship W1965864232A5028615222 @default.
- W1965864232 hasAuthorship W1965864232A5029364145 @default.
- W1965864232 hasAuthorship W1965864232A5035701638 @default.
- W1965864232 hasAuthorship W1965864232A5038811541 @default.
- W1965864232 hasAuthorship W1965864232A5044098423 @default.
- W1965864232 hasAuthorship W1965864232A5046173944 @default.
- W1965864232 hasAuthorship W1965864232A5061433318 @default.
- W1965864232 hasAuthorship W1965864232A5063428418 @default.
- W1965864232 hasAuthorship W1965864232A5070535511 @default.
- W1965864232 hasConcept C1012414 @default.
- W1965864232 hasConcept C159985019 @default.
- W1965864232 hasConcept C160671074 @default.
- W1965864232 hasConcept C171250308 @default.
- W1965864232 hasConcept C178790620 @default.
- W1965864232 hasConcept C185592680 @default.
- W1965864232 hasConcept C192157962 @default.
- W1965864232 hasConcept C192562407 @default.
- W1965864232 hasConcept C204223013 @default.
- W1965864232 hasConcept C2779227376 @default.
- W1965864232 hasConcept C41625074 @default.
- W1965864232 hasConcept C49040817 @default.
- W1965864232 hasConcept C521977710 @default.
- W1965864232 hasConcept C53524968 @default.
- W1965864232 hasConcept C544956773 @default.
- W1965864232 hasConcept C55493867 @default.
- W1965864232 hasConceptScore W1965864232C1012414 @default.
- W1965864232 hasConceptScore W1965864232C159985019 @default.
- W1965864232 hasConceptScore W1965864232C160671074 @default.
- W1965864232 hasConceptScore W1965864232C171250308 @default.
- W1965864232 hasConceptScore W1965864232C178790620 @default.
- W1965864232 hasConceptScore W1965864232C185592680 @default.
- W1965864232 hasConceptScore W1965864232C192157962 @default.
- W1965864232 hasConceptScore W1965864232C192562407 @default.
- W1965864232 hasConceptScore W1965864232C204223013 @default.
- W1965864232 hasConceptScore W1965864232C2779227376 @default.
- W1965864232 hasConceptScore W1965864232C41625074 @default.
- W1965864232 hasConceptScore W1965864232C49040817 @default.
- W1965864232 hasConceptScore W1965864232C521977710 @default.
- W1965864232 hasConceptScore W1965864232C53524968 @default.
- W1965864232 hasConceptScore W1965864232C544956773 @default.
- W1965864232 hasConceptScore W1965864232C55493867 @default.
- W1965864232 hasLocation W19658642321 @default.
- W1965864232 hasOpenAccess W1965864232 @default.
- W1965864232 hasPrimaryLocation W19658642321 @default.
- W1965864232 hasRelatedWork W1965864232 @default.
- W1965864232 hasRelatedWork W1969520063 @default.
- W1965864232 hasRelatedWork W1971562907 @default.
- W1965864232 hasRelatedWork W1980898018 @default.
- W1965864232 hasRelatedWork W1981850693 @default.
- W1965864232 hasRelatedWork W2000632220 @default.
- W1965864232 hasRelatedWork W2007161198 @default.
- W1965864232 hasRelatedWork W2052707132 @default.
- W1965864232 hasRelatedWork W2055042486 @default.
- W1965864232 hasRelatedWork W2061842895 @default.
- W1965864232 isParatext "false" @default.
- W1965864232 isRetracted "false" @default.
- W1965864232 magId "1965864232" @default.
- W1965864232 workType "article" @default.