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• W1966294709 abstract "Potassium adsorption on thin β-FeSi2 epitaxially grown on Si(111) was studied with ultra-violet photoemission spectroscopy (UPS), Auger electron spectroscopy (AES) and work function (WF) measurements. A value of (4.65 ± 0.03) eV was measured for the absolute WF of the silicide surface. A combination of the experimental results upon K deposition indicates a plausible mode of K adsorption on β-FeSi2. Initially K adsorbs on Si triangular sites with a Fe atom underneath up to a coverage of ∼ 2 × 1014 atoms cm−2 and then on Si triangular sites with no Fe underneath up to a saturation coverage of ∼ 2 × 1014 atoms cm−2." @default.
• W1966294709 created "2016-06-24" @default.
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• W1966294709 date "1991-05-01" @default.
• W1966294709 modified "2023-09-25" @default.
• W1966294709 title "Potassium adsorption on β-FeSi2 thin films" @default.
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• W1966294709 doi "https://doi.org/10.1016/0167-2584(91)90335-o" @default.
• W1966294709 hasPublicationYear "1991" @default.
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