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- W1966379718 abstract "A simple mathematical model has been employed to analyze quantitatively the crosslinking process in chemically amplified negative resists based on the combination of an epoxidized novolac resin and a photoacid generator. Experimental evaluation of a number of resists employing different resins has shown that sensitivity and contrast increase concomitantly. A resist formulation based on an experimental Dow resin designated DQ9 has demonstrated exceptional contrast and a sensitivity well matched to many e-beam systems." @default.
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- W1966379718 date "1995-02-01" @default.
- W1966379718 modified "2023-10-16" @default.
- W1966379718 title "Simple model of the lithographic response of “Hatzakis” chemically-amplified resists" @default.
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- W1966379718 doi "https://doi.org/10.1016/0167-9317(94)00135-h" @default.
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