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- W1966408411 abstract "Overlay measurements of the relative alignment between sequential layers are one of the most critical issues for integrated circuit (IC) lithography. We have implemented on an AFM platform a new intermittent-contact scanning capacitance microscopy (IC-SCM) mode that is sensitive to the tip proximity to an IC interconnect, thus making it possible to image conductive structures buried under planarized dielectric layers. Such measurements can be used to measure IC metal-to-resist lithography overlay. The AFM conductive cantilever probe oscillating in a vertical plane was driven at frequency ω, below resonance. By measuring the tip-to-sample capacitance, the SCM signal is obtained as the difference in capacitance, ΔC(ω), at the amplitude extremes. Imaging of metallization structures was obtained with a bars-in-bars aluminum structure embedded in a planarized dielectric layer 1 μm thick. We have also modeled, with a two-dimensional (2D) electrostatic field simulator, IC-SCM overlay data of a metallization structure buried under a planarized dielectric having a patterned photoresist layer deposited on it. This structure, which simulates the metal-to-resist overlay between sequential IC levels, allows characterization of the technique sensitivity. The capacitance profile across identical size electrically isolated or grounded metal lines embedded in a dielectric was shown to be different. The floating line shows capacitance enhancement at the line edges, with a minimum at the line center. The grounded line shows a single capacitance maximum located at the line center, with no edge enhancement. For identical line dimensions, the capacitance is significantly larger for grounded lines making them easier to image. A nonlinear regression algorithm was developed to extract line center and overlay parameters with approximately 3 nm resolution at the 95% confidence level, showing the potential of this technique for sub-micrometer critical dimension metrology. Symmetric test structures contribute to facilitate overlay data extraction." @default.
- W1966408411 created "2016-06-24" @default.
- W1966408411 creator A5003935666 @default.
- W1966408411 creator A5043415691 @default.
- W1966408411 creator A5090567323 @default.
- W1966408411 date "1998-01-01" @default.
- W1966408411 modified "2023-09-26" @default.
- W1966408411 title "Intermittent-contact scanning capacitance microscopy imaging and modeling for overlay metrology" @default.
- W1966408411 cites W149807329 @default.
- W1966408411 cites W2012439600 @default.
- W1966408411 cites W2076051214 @default.
- W1966408411 doi "https://doi.org/10.1063/1.56912" @default.
- W1966408411 hasPublicationYear "1998" @default.
- W1966408411 type Work @default.
- W1966408411 sameAs 1966408411 @default.
- W1966408411 citedByCount "0" @default.
- W1966408411 crossrefType "proceedings-article" @default.
- W1966408411 hasAuthorship W1966408411A5003935666 @default.
- W1966408411 hasAuthorship W1966408411A5043415691 @default.
- W1966408411 hasAuthorship W1966408411A5090567323 @default.
- W1966408411 hasBestOaLocation W19664084111 @default.
- W1966408411 hasConcept C120665830 @default.
- W1966408411 hasConcept C121332964 @default.
- W1966408411 hasConcept C133386390 @default.
- W1966408411 hasConcept C134406635 @default.
- W1966408411 hasConcept C154318817 @default.
- W1966408411 hasConcept C159985019 @default.
- W1966408411 hasConcept C171250308 @default.
- W1966408411 hasConcept C17525397 @default.
- W1966408411 hasConcept C187921700 @default.
- W1966408411 hasConcept C192562407 @default.
- W1966408411 hasConcept C204223013 @default.
- W1966408411 hasConcept C207789793 @default.
- W1966408411 hasConcept C26771246 @default.
- W1966408411 hasConcept C2779227376 @default.
- W1966408411 hasConcept C30066665 @default.
- W1966408411 hasConcept C49040817 @default.
- W1966408411 hasConcept C530198007 @default.
- W1966408411 hasConcept C53524968 @default.
- W1966408411 hasConcept C62520636 @default.
- W1966408411 hasConcept C99752389 @default.
- W1966408411 hasConceptScore W1966408411C120665830 @default.
- W1966408411 hasConceptScore W1966408411C121332964 @default.
- W1966408411 hasConceptScore W1966408411C133386390 @default.
- W1966408411 hasConceptScore W1966408411C134406635 @default.
- W1966408411 hasConceptScore W1966408411C154318817 @default.
- W1966408411 hasConceptScore W1966408411C159985019 @default.
- W1966408411 hasConceptScore W1966408411C171250308 @default.
- W1966408411 hasConceptScore W1966408411C17525397 @default.
- W1966408411 hasConceptScore W1966408411C187921700 @default.
- W1966408411 hasConceptScore W1966408411C192562407 @default.
- W1966408411 hasConceptScore W1966408411C204223013 @default.
- W1966408411 hasConceptScore W1966408411C207789793 @default.
- W1966408411 hasConceptScore W1966408411C26771246 @default.
- W1966408411 hasConceptScore W1966408411C2779227376 @default.
- W1966408411 hasConceptScore W1966408411C30066665 @default.
- W1966408411 hasConceptScore W1966408411C49040817 @default.
- W1966408411 hasConceptScore W1966408411C530198007 @default.
- W1966408411 hasConceptScore W1966408411C53524968 @default.
- W1966408411 hasConceptScore W1966408411C62520636 @default.
- W1966408411 hasConceptScore W1966408411C99752389 @default.
- W1966408411 hasLocation W19664084111 @default.
- W1966408411 hasOpenAccess W1966408411 @default.
- W1966408411 hasPrimaryLocation W19664084111 @default.
- W1966408411 hasRelatedWork W1500671573 @default.
- W1966408411 hasRelatedWork W1679061903 @default.
- W1966408411 hasRelatedWork W1974956974 @default.
- W1966408411 hasRelatedWork W1979895268 @default.
- W1966408411 hasRelatedWork W2021430689 @default.
- W1966408411 hasRelatedWork W2032086971 @default.
- W1966408411 hasRelatedWork W2055429897 @default.
- W1966408411 hasRelatedWork W2061455580 @default.
- W1966408411 hasRelatedWork W2063756661 @default.
- W1966408411 hasRelatedWork W2066987752 @default.
- W1966408411 hasRelatedWork W2067459068 @default.
- W1966408411 hasRelatedWork W2072514801 @default.
- W1966408411 hasRelatedWork W2076051214 @default.
- W1966408411 hasRelatedWork W2142945823 @default.
- W1966408411 hasRelatedWork W2153817601 @default.
- W1966408411 hasRelatedWork W2154425436 @default.
- W1966408411 hasRelatedWork W2168916750 @default.
- W1966408411 hasRelatedWork W2617896696 @default.
- W1966408411 hasRelatedWork W3166733740 @default.
- W1966408411 hasRelatedWork W3197515245 @default.
- W1966408411 isParatext "false" @default.
- W1966408411 isRetracted "false" @default.
- W1966408411 magId "1966408411" @default.
- W1966408411 workType "article" @default.