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- W1966446906 abstract "Two experimental approaches are described for reliable quantitative studies of thin-film nucleation and growth processes including epitaxial depositions. System 1 consists of a LEED-Auger instrument modified for the controlled vapor deposition on bulk substrates and is combined with advanced methods of very high resolution electron microscopy for the detailed analysis of film structure and orientation. System 2 is a UHV electron microscope adapted for in-situ deposition studies. The operational and functional features of each system are discussed leading to the selection of certain phases of a deposition problem that are best investigated in each of the systems. In general, however, the two approaches complement each other almost ideally, and the combined use of both can result in a comprehensive investigation of vapor deposition processes not obtainable with any other known method. Performance characteristics and application of each system to selected problems of vapor deposition studies are illustrated with examples from recent nucleation and growth work." @default.
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- W1966446906 date "1972-08-01" @default.
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- W1966446906 title "Experimental approaches to well controlled studies of thin-film nucleation and growth" @default.
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- W1966446906 doi "https://doi.org/10.1016/0029-554x(72)90642-8" @default.
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