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- W1966456028 abstract "The light propagation through high dose (1.75 × 1018 cm−2) 2 MeV O ion implantation profiles in silicon is theoretically and experimentally investigated. Maxwell's equations are integrated numerically in order to study the influence of the subsurface profile on reflectance and transmittance from the course of the electro-magnetic field. Depth profiles of the complex refractive index are determined from experimental reflection and transmission profiles. The dependence of n and k on the oxygen concentration is determined and compared with results of an effective medium model of SiOx. Die Lichtausbreitung in Hoch-Dosis-2 MeV-Sauerstoff-Ionenimplantationsprofilen (1,75 × 1018 cm−2) in Silizium wird theoretisch und experimentell dargestellt. Die Maxwellschen Gleichungen werden numerisch integriert, um am Verlauf der elektromagnetischen Feldstärke den Einfluß des Profils auf Reflexion und Transmission zu untersuchen. Das Tiefenprofil des komplexen Brechungsindexes wird aus gemessenen Profilen der Reflektivität und Transmission berechnet. Die ermittelte Abhängigkeit von n und k vom Sauerstoffgehalt wird mit Ergebnissen eines „effective medium”︁-Modells für SiOx verglichen." @default.
- W1966456028 created "2016-06-24" @default.
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- W1966456028 date "1981-12-16" @default.
- W1966456028 modified "2023-09-23" @default.
- W1966456028 title "The propagation of light waves through oxygen irradiation induced depth profiles of the complex refractive index in silicon" @default.
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- W1966456028 doi "https://doi.org/10.1002/pssa.2210680232" @default.
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