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• W1966671304 startingPage "1047" @default.
• W1966671304 abstract "Incorporation of silicon species from an alloy substrate into anodic titania is shown to stabilise the structure of the film, facilitating investigation of the ionic transport processes in amorphous titania grown at high efficiency. Thus, an amorphous anodic film developed on a sputtering-deposited Ti–6 at.%Si alloy formed to 100 V in phosphoric acid electrolyte in contrast to a partially crystalline film developed on relatively pure titanium at <20 V. Silicon species, which are immobile and act as marker species in the growing film, are present in the inner 58% of the film thickness. Evidently, the film material forms simultaneously at the film/electrolyte and alloy/film interfaces by co-operative transport of cations and anions, as is usual in amorphous anodic oxides. The phosphate anions incorporated from the electrolyte migrate inward at 0.34 times the rate of O2− ions and hence are present in the outer 62% of the film thickness." @default.
• W1966671304 created "2016-06-24" @default.
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• W1966671304 date "2002-05-01" @default.
• W1966671304 modified "2023-10-10" @default.
• W1966671304 title "Ionic transport in amorphous anodic titania stabilised by incorporation of silicon species" @default.
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• W1966671304 doi "https://doi.org/10.1016/s0010-938x(01)00111-1" @default.
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