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- W1966817641 abstract "Source Mask Optimization (SMO) is one of the most important techniques available for extending ArF immersionlithography. The combination of freeform source shape and complex mask pattern, determined by SMO, can extend thepractical resolution of a lithography system. However, imaging with a small k1 factor (~0.3 or smaller) is very sensitiveto many imaging parameters, such as illumination source shape error, lens aberration, process property, etc. As a result,care must be taken to insure that the source solution from SMO can be produced by the real illuminator, which is subjectto its own imaging constraints. One approach is to include an illuminator simulator in the SMO loop so that onlyrealizable illumination pupils are considered during optimization. Furthermore, the real source shape must be re-adjustedto realize expected imaging performance as may be seen, for example, in an Optical Proximity Effect (OPE)curve.In this paper we present and describe both the illuminator simulator, which can predict the real pupilgram on theexposure tool quickly, and an illumination pupilgram re-adjustment method that can effectively control the variousillumination parameters to get optimum imaging performance, which is required for the lithography process design.The adjusting method uses pupilgram modulation functions, which are similar to Zernike polynomials used in wavefrontaberration analysis for lithographic projection lens, to describe the optimal pupilgram adjustment, and the resultingmodulation can then be realized by the illuminator system." @default.
- W1966817641 created "2016-06-24" @default.
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- W1966817641 date "2011-09-22" @default.
- W1966817641 modified "2023-09-23" @default.
- W1966817641 title "Illumination pupilgram prediction and control method in advanced optical lithography" @default.
- W1966817641 doi "https://doi.org/10.1117/12.899032" @default.
- W1966817641 hasPublicationYear "2011" @default.
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