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- W1966842078 abstract "A very simple and inexpensive method of converting a barrel plasma etching system into a planar system is described. Details of structure and operating characteristics of the planar reaction chamber are shown." @default.
- W1966842078 created "2016-06-24" @default.
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- W1966842078 date "1985-05-01" @default.
- W1966842078 modified "2023-10-17" @default.
- W1966842078 title "Planar reactor plasma etching with barrel reactor power supply" @default.
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- W1966842078 doi "https://doi.org/10.1063/1.1138167" @default.
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