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- W1966872783 abstract "Various applications of an rf sensor to improve manufacturability and its use for equipment maintenance are discussed. It has been found that feedback control of the load power improved wafer to wafer repeatability for both etch rate and uniformity. The sensitivity of the rf measurements to changes in the physical or chemical properties of the discharge, their nonintrusive nature and real time monitoring capabilities suggest their use as a sophisticated process monitor. Process shifts, chamber coating and even misloaded wafers can all be detected. The use of the sensor for feedback control improved process latitude and repeatability. This allows for both tighter process specification and improved manufacturability." @default.
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- W1966872783 date "1994-09-16" @default.
- W1966872783 modified "2023-09-25" @default.
- W1966872783 title "<title>Measurement of discharge impedance for dry etch process control</title>" @default.
- W1966872783 doi "https://doi.org/10.1117/12.186777" @default.
- W1966872783 hasPublicationYear "1994" @default.
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