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• W1967011636 abstract "Hydrogenated amorphous carbon nitride (α-CN x :H) films (100-200 nm) were grown by direct ion beam deposition on Si( 100) substrates. Ion beams have been produced by electrostatic ion sources from C 6 H 14 +H 2 +N 2 gas mixtures. The influence of N 2 / C 6 H 14 +H 2 +N 2 gas ratio (N 2 concentration) on structure and properties of α-CN x :H films was investigated. The increase of N 2 concentration in the gas mixture resulted in decrease of sp 3 bonding and formation of the more graphite-like α-CN x :H films. Growth rate and refractive index of formed α-CN x :H films decreased with increasing N 2 concentration. A slight decrease of wear resistance (<20%) of the formed films with higher nitrogen ratio was also observed." @default.
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• W1967011636 date "2002-03-01" @default.
• W1967011636 modified "2023-09-24" @default.
• W1967011636 title "Ion beam synthesis of α-CNx:H films" @default.
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• W1967011636 doi "https://doi.org/10.1016/s0257-8972(01)01573-0" @default.
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