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• W1967046006 abstract "Titania films were deposited on glass substrates by RF magnetron sputtering method at different substrate temperatures which are room temperature, 50°C, 100°C, 150°C, 200°C, 250°C and 300°C. The surface morphology and cross section of the particles structure were studied using Field Emission Scanning Electron Microscope. It is shown that the increase in substrate temperature during the sputtering process up to 300°C will make the film become more dense and grown in a columnar structure. Significant changes occur on the titania thin film structure at 250°C due to the significant changes in the surface thermal energy and the surface diffusion." @default.
• W1967046006 created "2016-06-24" @default.
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• W1967046006 date "2013-09-01" @default.
• W1967046006 modified "2023-09-27" @default.
• W1967046006 title "Substrate Temperature Dependence on Sputtered Titania Thin Film" @default.
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• W1967046006 doi "https://doi.org/10.4028/www.scientific.net/amr.795.294" @default.
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