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- W1967074443 abstract "The first experimental results on light-induced annealing (LIA) of deposition-induced defects (DID) in hydrogenated amorphous silicon (a-Si:H) are reported. LIA of DID and of light-induced defects (LID) showed quite different behavior: the density of DID reduced by LIA amounted to less than one third of LID reduced by LIA, while thermal annealing reduced DID and LID very similarly. These results indicate a structural difference between the vicinities of DID and LID, and are discussed in connection with a structural model of a-Si:H." @default.
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- W1967074443 date "1993-12-01" @default.
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- W1967074443 title "Difference between deposition- and light-induced defects in a-Si:H studied by light-induced annealing experiments" @default.
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- W1967074443 doi "https://doi.org/10.1016/0022-3093(93)90522-y" @default.
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