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- W1967284391 abstract "Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation Chris H. Clifford, Tina T. Chan, Andrew R. Neureuther; Compensation methods for buried defects in extreme ultraviolet lithography masks. Journal of Vacuum Science & Technology B 1 January 2011; 29 (1): 011022. https://doi.org/10.1116/1.3531927 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology B Search Advanced Search |Citation Search" @default.
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- W1967284391 title "Compensation methods for buried defects in extreme ultraviolet lithography masks" @default.
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