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- W1967435751 abstract "Metal-containing carbon films are deposited on to the surfaces in question by means of various plasma-aided deposition procedures. Unlike the metal vapour generation usually used by a sputtering process we produce chromium- or titanium-stabilized carbon films by means of vacuum arc evaporation. A hollow cathode arc plasma is utilized for substrate cleaning and preparation steps. We have directed our attention to low deposition temperatures under warranting the adherence of the film. The adhesion measured by scratch test differs between critical loads of 35–50 N. This behaviour depends very heavily on the technological parameters of pretreatment and the ion cleaning procedure. With a metal content from 10 to 20 at.% the films demonstrate high, plastic hardness up to 15 GPa for a modulus of elasticity of approximately 100 GPa. With static depositions we attained deposition rates of up to 20 μm h−1. By optimizing the process we obtained a friction value of approximately 0.1 for the film-metal pairing and low abrasive wear rates at the uncoated counterpart." @default.
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- W1967435751 date "1995-12-01" @default.
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- W1967435751 title "Application of metal—C:H low-friction layers for bearing materials" @default.
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- W1967435751 doi "https://doi.org/10.1016/0257-8972(95)02604-5" @default.
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