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- W1967541674 abstract "Abstract The ability to control energy, species and species purity, as well as intensity makes ion beam technology of great importance for surface analysis, and for material modification where the modest mass transfer does not create a limitation. The range of energy available extends from a few electron volts to megavolts. Some types of equipment have already seen considerable development such as the ion implanter, MBE systems with ion enhancement and ion beam microlithography tools. Yet it is clear that further improvements will be required if this equipment is not to limit the progress of the semiconductor industry. The status of ion implantation equipment will be reviewed and directions of research leading to equipment improvement will be indicated." @default.
- W1967541674 created "2016-06-24" @default.
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- W1967541674 date "1989-02-01" @default.
- W1967541674 modified "2023-09-27" @default.
- W1967541674 title "Advanced ion beam equipment used for semiconductor production" @default.
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- W1967541674 doi "https://doi.org/10.1016/0168-583x(89)90130-4" @default.
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