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• W1967561345 abstract "The deposition of stoichiometric alumina films by means of d.c. reactive sputtering was investigated. The oxidation and hot corrosion performance of the Al2O3 films on Ni-base superalloys were evaluated. The oxygen partial pressure (PO2) could dramatically affect the chemical compositions and microstructures of the deposited films, and two PO2 thresholds were revealed, showing close relations with the increase or decrease of PO2 during sputtering. When PO2 varied through the PO2 thresholds, the total gas pressure, the sputtering voltage and the depositing rate exhibited abrupt changes. If PO2 was lower than the PO2 thresholds, the sputtered films were mainly composed of metallic aluminum with little alumina. When PO2 was higher than the PO2 thresholds the films were composed only of amorphous alumina. The Al2O3 films deposited on superalloys can reduce their oxidation rates by 3–8 times. It was observed that Cr2O3 grew both in the cracks within the Al2O3 films and at the film-substrate interface at 1273 K or below. At 1373 K, the Al2O3 film was gradually displaced by a mixed layer of Al2O3 and Cr2O3. It is proposed that the oxidation of the specimens coated with Al2O3 is controlled predominantly by inward diffusion of anions through the Al2O3 films at 1273 K or below, and by outward diffusion of cations through the (Al, Cr)2O3 layers formed during the degradiation of the Al2O3 film at the higher temperature, 1373 K. The Al2O3 films showed beneficial effects on the hot-corrosion resistance of superalloys GH30 and K38G. The Al2O3 films on specimens of GH30 eliminated internal sulfidation and oxidation, while those on K38G alleviated internal sulfidation and oxidation." @default.
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• W1967561345 date "1995-02-01" @default.
• W1967561345 modified "2023-09-23" @default.
• W1967561345 title "Reactive sputter deposition of alumina films on superalloys and their high-temperature corrosion resistance" @default.
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• W1967561345 doi "https://doi.org/10.1016/0257-8972(94)02289-3" @default.
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