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- W1967877222 abstract "The deposition of a-C:H films by an ECR microwave plasma and an ECR microwave ion beam source is described. Optical, electrical, mechanical measurements and different analytical methods are used for the film characterization. The films deposited of a rate of about 200 nm/min develops a high electrical resistance (109 to 1014ω cm), a good IR transparency, an optical gap of about 1.7 eV, and a hardness up to 30 GPa (measured on Si-substrates). Es wird die a-C: H-Abscheidung mit Hilfe der Ecr-Mikrowellenionenquelle aus dem Mikrowellenplasma beschrieben. Optische, elektrische, mechanische Messungen und verschiedene Analysemethoden werden zur Schichtcharakterisierung genutzt. Die Schichten (Abscheiderate bis zu 200 nm/min) haben einen hohen elektrischen spezifischen Widerstand (109 bis 1014 ω cm), eine gute Ir-Transparenz, ein optisches Gap von ca. 1,7 eV und eine Härte bis zu 30 GPa (gemessen auf Si-Substraten)." @default.
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- W1967877222 date "1989-04-16" @default.
- W1967877222 modified "2023-09-25" @default.
- W1967877222 title "Deposition of Hydrogenated Amorphous Carbon Films by an ECR Microwave Plasma" @default.
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- W1967877222 doi "https://doi.org/10.1002/pssa.2211120222" @default.
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