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- W1968179638 abstract "Electrical properties of tantalum oxide (Ta2O5) thin films formed by metalorganic decomposition have been studied with respect to their defect states. A shallow band of defect states, which are the origin of hole traps, is detected by thermally stimulated current. The defect states in the Ta2O5 films are fully suppressed with additive elements such as TiO2 and WO3. It is considered that oxygen vacancies are fully compensated by Ti4+ ions or W6+ ions that are substitutionally incorporated into Ta5+ sites." @default.
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- W1968179638 date "2003-10-01" @default.
- W1968179638 modified "2023-09-26" @default.
- W1968179638 title "Reduction of defect states of tantalum oxide thin films with additive elements" @default.
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- W1968179638 doi "https://doi.org/10.1016/j.mssp.2003.04.001" @default.
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