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• W1968197532 abstract "Nanoindentation-induced defects on ultrathin (h = 17 nm) polystyrene (PS) films that are spin cast on silicon (Si) substrates, with residual depths of penetration lower than the film thickness (<17 nm), can either grow to initiate dewetting or level, which results in a flat polymer surface, upon heating above the glass-transition temperature (T(g)). The excess surface energy (DeltaF(gamma)) of the system, which is added to the initially flat coating with the formation of an indent, provides a critical value, DeltaF(gamma,crit) = 6.1 x 10(-16) J, which determines indent evolution upon annealing. An indent grows when DeltaF(gamma) > DeltaF(gamma,crit) and levels when DeltaF(gamma) < DeltaF(gamma,crit). This conclusion is in agreement with previous reports, which used DeltaF(gamma) to distinguish the two (dewetting/leveling) opposing processes (1) in the case of indents deeper than the film thickness and (2) in the case of built-in ordered surface disturbances by capillary force lithography." @default.
• W1968197532 created "2016-06-24" @default.
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• W1968197532 creator A5042669706 @default.
• W1968197532 date "2005-08-25" @default.
• W1968197532 modified "2023-09-23" @default.
• W1968197532 title "A Criterion for Dewetting Initiation from Surface Disturbances on Ultrathin Polymer Films" @default.
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• W1968197532 doi "https://doi.org/10.1021/la050998h" @default.
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