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- W1968315024 abstract "C60 fullerene clusters are used as a carbon source to deposit unhydrogenated amorphous carbon films. C60 clusters are sublimated by heating up to 850 °C. The sublimated fullerene powders are injected to an electron beam excited argon plasma and dissociated to be active species. Consequently, the carbon species condense as a thin film on the negatively biased substrates that are immersed in the plasma. Deposition rates of approximately 1.0 µm/h and the average surface roughness of 0.2 nm are achieved. X-ray diffraction pattern reveals that the microstructure of the film is amorphous while fullerene film deposited without the plasma shows crystal structure. Raman spectroscopic analysis shows that the films are one of the types of diamond-like carbon films. The nano-indentation technique is used for hardness measurement of the films and results in hardness up to about 20 GPa." @default.
- W1968315024 created "2016-06-24" @default.
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- W1968315024 date "2010-01-01" @default.
- W1968315024 modified "2023-09-27" @default.
- W1968315024 title "Deposition of unhydrogenated amorphous carbon films by sublimation of C60 fullerene in electron beam excited plasma" @default.
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- W1968315024 doi "https://doi.org/10.1016/j.matlet.2009.08.063" @default.
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