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- W1968385768 abstract "Electrodeposition of iron into porous n-type silicon (n-PS) was investigated. The electrodeposition was performed potentiostatically as well as potentiodynamically. Current efficiency was proved by anodic dissolution. The deposition is only possible after removal of the oxide layer, which covers the surface and pore walls of n-PS. The deposit was studied with X-ray photoelectron spectroscopy sputter depth profiling." @default.
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- W1968385768 date "1996-04-01" @default.
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- W1968385768 title "Electrical contact to porous silicon by electrodeposition of iron" @default.
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- W1968385768 doi "https://doi.org/10.1016/0040-6090(95)08045-7" @default.
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