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• W1968657821 abstract "An amorphous Si film with thickness of 350 nm was fabricated on both Cu substrate and Ni film (under layer)/Cu substrate by direct current (DC) and radio frequency (RF) magnetron sputtering. The surface morphology, crystallographic structure and electrochemical properties were investigated. Flat surface was formed in Si/Cu film, whereas in Si/Ni/Cu film a rough surface was formed consisting of Si clusters. In a Si/Li half-cell test with current densities of 210 (0.05 C-rate), 810 (0.2 C-rate) and 4200 mA g−1 (1 C-rate), the surface-modified Si film electrode exhibited a significantly improved cycle performance compared to the Si film deposited on only Cu substrate. LiFePO4/Si full cell tested at current density 85 mA g−1 of (0.5 C-rate) displayed the first charge capacity of 154.0 mAh g−1, corresponding to 90.5% of theoretical capacity of LiFePO4 and the capacity retention of 79.4% at 20th cycle." @default.
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• W1968657821 date "2009-04-01" @default.
• W1968657821 modified "2023-10-16" @default.
• W1968657821 title "Surface-modified Si thin film electrode for Li ion batteries (LiFePO4/Si) by cluster-structured Ni under layer" @default.
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• W1968657821 doi "https://doi.org/10.1016/j.jpowsour.2008.08.018" @default.
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