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• W1968789265 abstract "This article describes a process flow that has enabled the first demonstration of functional, fully self-aligned 100nm enhancement mode GaAs metal-oxide-semiconductor field-effect transistors (MOSFETs) with GaxGdyOz as high-κ dielectric, Pt∕W as metal gate stack, and SiN as sidewall spacers. The flow uses blanket metal and dielectric deposition and low damage dry etch modules. As a consequence, no critical dimension lift-off processes are required. Encouraging data are presented for 100nm gate length devices including threshold voltage of 0.32V, making these the shortest, fully self-aligned gate length enhancement mode III-V MOSFETs reported to date. This work is a significant step forward to the demonstration of high performance “siliconlike” III-V MOSFETs." @default.
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• W1968789265 date "2009-01-01" @default.
• W1968789265 modified "2023-10-18" @default.
• W1968789265 title "Fully self-aligned process for fabricating 100 nm gate length enhancement mode GaAs metal-oxide-semiconductor field-effect transistors" @default.
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• W1968789265 doi "https://doi.org/10.1116/1.3256624" @default.
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