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- W1969001551 abstract "The effect of the chlorine concentration in silicon dioxide films thermally grown in or atmospheres on the negative bias instability of the effective oxide charge has been investigated at elevated temperatures. Also considered were the effects due to silicon orientation, silicon conductivity type, and silicon oxidation temperature. The effective oxide charge increased with increasing chlorine concentration, the oxides showing larger increases than the oxides. Distortions in the capacitance‐voltage curves were found to be more prevalent for structures prepared using n‐type silicon substrates than for p‐type. For the (100) oriented samples, essentially the entire increase observed was eliminated by a heat‐treatment at 500°C in nitrogen with aluminum present on the oxide surface, whereas only 90% of the effect was removed in the case of (111) oriented wafers which underwent the same treatment." @default.
- W1969001551 created "2016-06-24" @default.
- W1969001551 creator A5015222297 @default.
- W1969001551 date "1977-05-01" @default.
- W1969001551 modified "2023-09-26" @default.
- W1969001551 title "Effect of Chlorine on the Negative Bias Instability in MOS Structures" @default.
- W1969001551 doi "https://doi.org/10.1149/1.2133397" @default.
- W1969001551 hasPublicationYear "1977" @default.
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