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- W1969018690 abstract "The desorption kinetics of chlorine adsorbed on Si(111)7 × 7 were studied using molecular beam scattering (MBS) and temperature programmed desorption (TPD) with a chlorine molecular beam. The desorption of SiCl and SiCl2 was observed in the MBS experiments. Most of the desorption products were SiCl2. The intensity of the SiCl desorption remarkably increased with sample temperature above 800°C. The SiCl2 desorption above 600°C was attributed to the recombinative reaction of SiCl, which has second-order kinetics. The SiCl2 desorption at 450°C was found in both MBS and TPD experiments. This desorption was observed only when chlorine interacts with the adatoms of the 7 × 7 structure on the Si(111) surface and TPD studies of this desorption revealed first-order reaction kinetics. Desorption at 450°C was attributed to direct desorption of the SiCl2, which was formed on the adatom." @default.
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- W1969018690 date "1993-03-01" @default.
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- W1969018690 title "Reaction kinetics of chlorine on Si(111)7 × 7 surfaces" @default.
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- W1969018690 doi "https://doi.org/10.1016/0039-6028(93)90958-m" @default.
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