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- W1969106402 abstract "As part of a programme to study the basic properties of secondary electron emitters, secondary electron emission yield measurements at various primary energies and angles of incidence have been performed on bulk samples of glass used to construct channel plates. A dc technique was used involving the measurement of currents in the target and collector circuits. A brief description of the technique will be given. From these measurements a value has been obtained for the escape depth of the secondary electrons. Energy analysis of the secondary electrons, using a retarding field analyser, has enabled backscattering factors and an approximate value for the most probable energy of emission to be determined. The chemical compositions of the surface (top 1 nm) and the surface region down to 200 nm have been determined using Auger electron spectroscopy and argon ion etching. Comparisons have been made between yield and surface compositions from which a pronounced positive correlation has been established between yield and potassium and carbon surface concentrations. Argon ion etching has also enabled a conductivity profile of the surface region to be established. This has shown that the top of the conducting layer is positioned about 10–20 nm below the surface and extends only a depth of about 200 nm." @default.
- W1969106402 created "2016-06-24" @default.
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- W1969106402 date "1976-11-01" @default.
- W1969106402 modified "2023-09-27" @default.
- W1969106402 title "Secondary electron emission and surface compositional studies of channel plate glass surfaces" @default.
- W1969106402 doi "https://doi.org/10.1016/0042-207x(76)90224-4" @default.
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