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- W1969436167 abstract "The results of analysis techniques using ion milling for in-depth profiling are strongly influenced by effects of the impacting ion beam. In order to gain insight in these effects, a model has been developed, based on a transport-theoretical approach, which incorporates isotropic collisionat mixing, ion-impurity knock-on, and implantation of sputter ions. This model accounts for different target masses in amorphous polyatomic targets, and provides insight in the role of mass on ion beam effects such as preferential sputtering, yield, energy distribution, depth of origin and angular distribution of sputtered particles. In addition shifts and broadenings of profiles can be predicted by the computation." @default.
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- W1969436167 date "1985-01-01" @default.
- W1969436167 modified "2023-09-26" @default.
- W1969436167 title "Theoretical analysis of sputter profiling" @default.
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- W1969436167 doi "https://doi.org/10.1016/0584-8547(85)80130-0" @default.
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