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- W1969588045 abstract "Abstract The optical and mechanical properties of SiO2, Al2O3 and TiO2 films deposited by pulsed laser evaporation (TEA CO2 laser) as well as by normal thermal evaporation (electron-gun) have been measured. The optical absorption and scattering losses of the films at 611 nm wavelength are determined from a precise reflection/transmission measurement. The refractive indices of the films are estimated from their reflection spectra. The adhesion strength and abrasion-resistance of the films have been evaluated quantitatively, the former using a pull test method. A modified rub test method is described which gives a quantitative indication for a wide range of the abrasion-resistances of thin films." @default.
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- W1969588045 date "1990-01-01" @default.
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- W1969588045 title "Mechanical and optical properties of oxide thin films deposited by pulsed laser reactive evaporation" @default.
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- W1969588045 doi "https://doi.org/10.1016/0042-207x(90)90099-k" @default.
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