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- W1969956753 abstract "In the systems Ge (111)-amorphous film of SiO2 or Si3N4 interaction of two types of dislocations is investigated. The first are due to substrate bending and the second are explained by edge effects near film islands or sample edge. The interaction of the above dislocation types leads to the appearance of Lomer or 60° dislocations. Mutual position of dislocations, thickness, and the rigidity of film affect the reaction substantially. Dislocation multiplication processes in island structures are discussed and the stress level in the system is estimated. [Russian Text Ignored]" @default.
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- W1969956753 date "1979-12-16" @default.
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- W1969956753 title "Dislocation interactions in germanium covered with dielectric films" @default.
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- W1969956753 doi "https://doi.org/10.1002/pssa.2210560203" @default.
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