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- W1970010081 endingPage "14914" @default.
- W1970010081 startingPage "14909" @default.
- W1970010081 abstract "Nanoimprint lithography is applied to fabricate topographically uniform patterns onto demixed polymer blend films. The high fidelity of pattern replications is achieved for 150 nm polystyrene (PS)/polymethylmethacrylate (PMMA) blend films with varying compositions. When imprinted at 150 °C, the morphology of the blend across the patterned structures is similar to that in the as-casted films. Significant morphological evolutions occur for patterns imprinted at 180 and 210 °C. For all the patterns, PMMA is found to segregate into the residual layer, driven by the preferential wetting of PMMA onto the SiOx surfaces. The combined domain coarsening and preferential wetting of PMMA leads to the formations of unique encapsulated structures within the topographically uniform features, ranging from blocks to threads." @default.
- W1970010081 created "2016-06-24" @default.
- W1970010081 creator A5017614510 @default.
- W1970010081 creator A5065058975 @default.
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- W1970010081 date "2010-08-26" @default.
- W1970010081 modified "2023-09-27" @default.
- W1970010081 title "Topographically Uniform but Chemically Heterogeneous Nanostructures by Nanoimprinting Demixed Polymer Blends" @default.
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- W1970010081 doi "https://doi.org/10.1021/la102523t" @default.
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