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- W1970260078 abstract "Since the early 1970s ion implantation into metal has been used successfully in the field of tribology. Because of the availability of high-current ion sources for gas ions, the most widely applied process is the implantation of nitrogen ions into various kinds of steel. Apart from direct implantation, ion-beam-assisted processes (IBAD) and ion beam mixing processes (IBM) are becoming increasingly important. In most cases the IBM process is performed with high energy implanters whereas the IBAD processes are performed with low energy ion sources in combination with electron beam evaporators within one process chamber. In addition to these established processes, the present paper presents the combination of high current medium energy ion beams with high rate magnetron sputtering. The ion beam is used for the pretreatment of the substrates, for assisting the growing film, for mixing of thin film layers and for post-treatment of reactively sputtered nitrides. The processes have been performed in a prototype implanter for industrial use applying a radio frequency ion source with slit-shaped ion optics which fit the demands of modern sputter sources with respect to beam size and dose rate. Evaluation of the films has been carried out using REM, SNMS, Rockwell C, Scratch test and pin on disc test. It is shown that medium-energy linear ion sources can be used sucessfully and simultaneously together with magnetron sputter sources within one process chamber. This can be done with already existing highly productive batch-type coating machines and also with in-line coaters by adapting the ion source so that it can be used in place of an additional magnetron source. The combination of magnetron sputter sources with simultaneously operating ion sources allows a highly controllable process, which fits the demands of high quality coatings for the future. This applies especially to the coating of polymers and ceramics." @default.
- W1970260078 created "2016-06-24" @default.
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- W1970260078 date "1995-09-01" @default.
- W1970260078 modified "2023-09-26" @default.
- W1970260078 title "The role of ion implantation in industrial sputtering processes for tribological applications" @default.
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- W1970260078 doi "https://doi.org/10.1016/0257-8972(95)08362-6" @default.
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