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• W1970585057 abstract "Dc reactive sputtering was used to deposit tantalum metal/oxide periodic nanometric multilayers using the artful technique namely, the reactive gas pulsing process (RGPP). Different pulsing periods were used for each deposition to produce metal-oxide periodic alternations included between 5 and 80 nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Transmission Electron Microscopy (TEM) and Energy-dispersive X-ray (EDX) spectroscopy techniques. Moreover, electrical properties were also studied by the van der Pauw technique." @default.
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• W1970585057 date "2013-07-01" @default.
• W1970585057 modified "2023-10-16" @default.
• W1970585057 title "Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers" @default.
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• W1970585057 doi "https://doi.org/10.1016/j.surfcoat.2012.10.064" @default.
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