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- W1970641207 abstract "SVG Lithography (SVGL) has established and is executing a comprehensive program for the development of an advanced 157 nm Lithography Exposure System capable of processing 70 nm critical dimensions for three years now. This paper presents the approach, and details the present state of the challenges in the development of 157 nm lithography. It also describes the SVGL 157 nm program approach and provides some insight into the progress made to date addressing the challenges. Specific attention is paid to addressing 3 critical areas: Molecular contamination/purging, optical coating, and optical surfacing." @default.
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- W1970641207 date "2001-09-14" @default.
- W1970641207 modified "2023-10-14" @default.
- W1970641207 title "SVG 157-nm lithography technical review" @default.
- W1970641207 doi "https://doi.org/10.1117/12.435789" @default.
- W1970641207 hasPublicationYear "2001" @default.
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