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- W1970702557 abstract "Magnetic properties of sputtered Co films with thicknesses of 20 to 280 nm which were deposited at Ar gas pressures P Ar of 0.4 to 6.6 Pa were studied. The crystal phase was a mixture of fcc and hcp, and there was no preferred orientation. The relative volume fraction of hcp phase tends to increase with P Ar . The in-plane coercive force H c ranges from 2.4 to 12.1 kA/m. The remanence ratio J r /J s was 0.55 to 0.95. Large intrinsic perpendicular anisotropy fields 2K u /J s of 0.54 MA/m due to the columnar structure were observed for films prepared at high P Ar . Both H c and J r /J s are found to be determined by internal stress, crystallite size and perpendicular anisotropy. The saturation polarization J s was 73 to 94% of that of bulk hcp Co." @default.
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- W1970702557 date "1999-12-01" @default.
- W1970702557 modified "2023-09-27" @default.
- W1970702557 title "Magnetic Properties of Sputtered Co Films" @default.
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- W1970702557 doi "https://doi.org/10.1002/(sici)1521-396x(199912)176:2<1039::aid-pssa1039>3.0.co;2-b" @default.
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