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• W1970721851 abstract "Amorphous silicon-oxygen alloy films with various composition have been prepared by r.f. glow discharge decomposition of SiH4 and CO2 gas mixtures. The analysis of infrared absorption spectra and x-ray photoemission spectra shows that the film consists of two phases, a silicon-rich phase and an oxygen-rich phase. We suggest that this two-phase structure results in the high photoconductivity with wide optical gap in these films." @default.
• W1970721851 created "2016-06-24" @default.
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• W1970721851 date "1993-12-01" @default.
• W1970721851 modified "2023-10-12" @default.
• W1970721851 title "Structure of high-photosensitivity silicon-oxygen alloy films" @default.
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• W1970721851 doi "https://doi.org/10.1016/0022-3093(93)91187-8" @default.
• W1970721851 hasPublicationYear "1993" @default.
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