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• W1970737814 endingPage "2774" @default.
• W1970737814 startingPage "2771" @default.
• W1970737814 abstract "Spatially resolved concentration profiles of ground-state oxygen atoms in O2/Ar plasmas have been obtained under loaded etching conditions through the use of a two-photon laser excitation process. These results provide a quantitative measure of the reactive atom concentration gradient during etching of kapton or graphite on the rf-driven electrode. The effects of load, ion bombardment, and diffusion on the reactive atom concentration may be directly monitored by this in situ, unobtrusive, three-dimensional probe technique." @default.
• W1970737814 created "2016-06-24" @default.
• W1970737814 creator A5017638858 @default.
• W1970737814 date "1986-10-15" @default.
• W1970737814 modified "2023-10-16" @default.
• W1970737814 title "Spatially resolved detection of O atoms in etching plasmas by two-photon laser-induced fluorescence" @default.
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• W1970737814 doi "https://doi.org/10.1063/1.337109" @default.
• W1970737814 hasPublicationYear "1986" @default.
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