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- W1970772804 abstract "The paper describes a simple, safe, and effective method for forming shallow zinc-doped p-type layers on chromium-doped semiinsulating GaAs, using an open-tube diffusion technique. The resulting peak dopant concentration for the 850-C diffusion was 10 to the 20th/cu cm. The contact resistance of ohmic contacts fabricated on these layers was found to be about 0.00005 ohm/sq cm. The variation of the contact resistance across the wafer reflected the variation of the doping concentration." @default.
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- W1970772804 date "1987-09-01" @default.
- W1970772804 modified "2023-09-22" @default.
- W1970772804 title "Ohmic Contact Formation in Semi‐Insulating GaAs Using Shallow Heavily Doped p‐Type Layers" @default.
- W1970772804 doi "https://doi.org/10.1149/1.2100889" @default.
- W1970772804 hasPublicationYear "1987" @default.
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