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- W1970786723 abstract "NBTI lifetime data for 10% Idsat shift (and 10% Vtsat shift) vs. stress voltage for different transistor geometries with a nitrided thin gate oxide were measured over a wide range of stress gate voltages. It was found that the voltage acceleration factor increases with decreasing stress voltage resulting in a non-linearity of the log lifetime vs. stress voltage relationship. It was also found that the large area MOSFET exhibits NBTI saturation phenomena after stressing over a long time period before it reaches the 10% Idsat shift lifetime limit criteria. The lifetime vs. PMOSFET geometry will also be discussed in detail." @default.
- W1970786723 created "2016-06-24" @default.
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- W1970786723 date "2003-01-01" @default.
- W1970786723 modified "2023-09-23" @default.
- W1970786723 title "Voltage acceleration NBTI study for a 90nm CMOS technology" @default.
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- W1970786723 doi "https://doi.org/10.1109/irws.2003.1283324" @default.
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