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- W1970805655 abstract "The regrowth of radiation-damaged layers created by carbon ion implantation in natural diamond was investigated by the Rutherford backscattering/channeling technique and by optical absorption. We present the first results of rapid thermal annealing of the implanted samples directly from the 77 K implantation temperature to 1100° C as well as data for isochronal annealing. We found that isochronal annealing up to 900° C was more effective than rapid thermal annealing for amorphized samples. The critical dose for amorphization of diamond was between 1.65 × 1015 and 3 × 1015 cm−2 for 200 keV carbon ion implantation at 77 K." @default.
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- W1970805655 date "1990-01-01" @default.
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- W1970805655 title "Regrowth of radiation-damaged layers in natural diamond" @default.
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- W1970805655 doi "https://doi.org/10.1016/0168-583x(90)90866-s" @default.
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