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- W1970823101 abstract "The microwave-plasma-assisted chemical vapor deposition (CVD) of diamond film with ( H 2 +CO+O 2 ) gaseous source revealed increasing net growth rate with O 2 addition up to 0.5%, although the etching rate itself markedly increased with O 2 . To understand the effect of oxygen on CVD, we have proposed a possible model for diamond surface reaction, a modified Harris model [Appl. Phys. Lett. 56 (1990) 2298], by taking into account the forced hydrogen abstraction from the surface structure associated with chemical reaction with OH species. Our model, though still slightly rough, explained to a certain extent the observed increase in the diamond growth rate upon oxygen addition." @default.
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- W1970823101 date "1994-03-01" @default.
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- W1970823101 title "Effects of Oxygen Added to Reagent Gas on Chemical Vapor Deposition of Diamond Thin Films" @default.
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- W1970823101 doi "https://doi.org/10.1143/jjap.33.l459" @default.
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