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Matches in SemOpenAlex for { <https://semopenalex.org/work/W1970843578> ?p ?o ?g. }

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• W1970843578 abstract "A series of high-performance polycarbonates have been prepared with glass-transition temperatures and decomposition temperatures that are tunable by varying the repeat-unit chemical structure. Patterning of the polymers with extreme UV lithography has been achieved by taking advantage of direct photoinduced chain scission of the polymer chains, which results in a molecular-weight based solubility switch. After selective development of the irradiated regions of the polymers, feature sizes as small as 28.6 nm have been printed and the importance of resist-developer interactions for maximizing image quality has been demonstrated." @default.
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• W1970843578 date "2010-08-16" @default.
• W1970843578 modified "2023-09-27" @default.
• W1970843578 title "Patterning of Tailored Polycarbonate Based Non-Chemically Amplified Resists Using Extreme Ultraviolet Lithography" @default.
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• W1970843578 doi "https://doi.org/10.1002/marc.201000117" @default.
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